AFM Study on Reliability of Nanoscale DLC Films Deposited by ECR-MPCVD
来源期刊：材料热处理学报2004年第5期
论文作者：ZHU Shi-gen DING Jian-ning ZHU Shou-xing
关键词：DLC; AFM; indentation; scratch; wear;
摘 要：Nanoindentation, scratch and wear tests based on an atomic force microscope (AFM) were carried out to study the reliability of diamond-like carbon (DLC) films, deposited by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD). The predictors for film reliability were given to investigate the resistance of DLC films to indent, scratch, and wear. Experimental results showed that the films at 64.9nm and 12.07nm exhibited better reliability than thin one at 2.78nm, 4.48nm. In addition, the reliability strength of films above 12.07nm went stable, and the films showed good performance of anti-indentation, anti-scratch and anti-wear. Finally, size effect of nanoscale monolayer film was introduced to explain the reliability of nanoscale DLC films.
ZHU Shi-gen1，DING Jian-ning2，ZHU Shou-xing1
(1.School of Mechanical Engineering, Donghua University, Shanghai 200051, China;
2.Micro/Nano Science and Technology Center, Jiangsu University, Zhenjiang 212013, China)
摘要:Nanoindentation, scratch and wear tests based on an atomic force microscope (AFM) were carried out to study the reliability of diamond-like carbon (DLC) films, deposited by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD). The predictors for film reliability were given to investigate the resistance of DLC films to indent, scratch, and wear. Experimental results showed that the films at 64.9nm and 12.07nm exhibited better reliability than thin one at 2.78nm, 4.48nm. In addition, the reliability strength of films above 12.07nm went stable, and the films showed good performance of anti-indentation, anti-scratch and anti-wear. Finally, size effect of nanoscale monolayer film was introduced to explain the reliability of nanoscale DLC films.
关键词:DLC; AFM; indentation; scratch; wear;
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