Development of Electrospray Laser Chemical Vapour Deposition for Homogenous Alumina Coatings
来源期刊：Journal Of Wuhan University Of Technology Materials Science Edition2016年第1期
论文作者：Teiichi KIMURA
文章页码：11 - 14
摘 要：Electrospray,as a liquid source supply system,has been applied to chemical vapour deposition（CVD）.In thermal CVD,the microstructure of the obtained films changes from dense to coarse granular because of the decreasing surface temperature during deposition.Using the electrospray laser chemical vapour deposition method,we prepared homogenous alumina coatings.We found that laser irradiation was effective in compensating the surface temperature decrease,and an alpha-alumina coating with dense columnar microstructures was obtained at a deposition rate of 200 μm/h using 200 W Nd:YAG laser irradiation.
Teiichi KIMURA
Japan Fine Ceramics CenterState Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology
摘 要：Electrospray,as a liquid source supply system,has been applied to chemical vapour deposition（CVD）.In thermal CVD,the microstructure of the obtained films changes from dense to coarse granular because of the decreasing surface temperature during deposition.Using the electrospray laser chemical vapour deposition method,we prepared homogenous alumina coatings.We found that laser irradiation was effective in compensating the surface temperature decrease,and an alpha-alumina coating with dense columnar microstructures was obtained at a deposition rate of 200 μm/h using 200 W Nd:YAG laser irradiation.
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