Dynamic scaling behavior of iron nitride thin films prepared by magnetron sputtering and ion implantation

来源期刊：中国有色金属学报(英文版)2005年第z2期

论文作者：李伟力 孙跃 费维栋

文章页码：236 - 239

Key words：dynamic scaling behavior； grazing incidence X-ray scattering； iron nitride film； ion implantation

Abstract: Under far from equilibrium conditions, the formation mechanism of solid can be studied in terms of the dynamic scaling theory. The roughness and dynamic scaling behavior of the Fe-N thin films were studied by atomic force microscopy and grazing incidence X-ray scattering. The results indicate that the roughness of the surface increases with increasing sputtering time during the course of magnetron sputtering, and the surface exhibits a fractal characteristic. While the Fe-N films prepared by compound technology—combining magnetron sputtering with plasma based ion implantation are not in agreement with the fractal theory.