Formation Conditions of TiN Coatings by Reactive Magnetron Sputtering and Its Characteristics
来源期刊：Rare Metals1989年第4期
论文作者：Zhang Xuehua Cheng Shide Chen Guanwu Wang Donghui General Research Institute for Non-ferrous Metals,Beijing
文章页码：32 - 37
摘 要：<正> The TiN coatings on the surfaces of various cemented carbides were performed by use of reactive magnetron sputtering.Thehighest microhardness which was obtained in our experiment was 49 GPa.The order of effect weights of deposition parameters isP∑,β,Ts,...,which resulted from the LI6 experiments according to orthogonal design.The pole density analysis indicated thatthere were a few of the textureless samples.The crystal orientation of TiN exhibited clear regularity and affected microhardnessand other properties of films remarkably.A concept relating to structure factor was proposed.A layer-like structure was found.SAES showed that a transition layer exists between substrate and coating and its thickness is of the order of micron.The forma-tion mechanism of film was discussed.
摘要：<正> The TiN coatings on the surfaces of various cemented carbides were performed by use of reactive magnetron sputtering.Thehighest microhardness which was obtained in our experiment was 49 GPa.The order of effect weights of deposition parameters isP∑,β,Ts,...,which resulted from the LI6 experiments according to orthogonal design.The pole density analysis indicated thatthere were a few of the textureless samples.The crystal orientation of TiN exhibited clear regularity and affected microhardnessand other properties of films remarkably.A concept relating to structure factor was proposed.A layer-like structure was found.SAES showed that a transition layer exists between substrate and coating and its thickness is of the order of micron.The forma-tion mechanism of film was discussed.
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