简介概要

Enhanced thermoelectric property and stability of NiCr–NiSi thin film thermocouple on superalloy substrate

来源期刊:Rare Metals2017年第6期

论文作者:Xiao-Hui Zhao Yi-Ran Wang Yin-Zhi Chen Hong-Chuan Jiang Wan-Li Zhang

文章页码:512 - 516

摘    要:Thin film thermocouples(TFTCs) can provide fast and accurate surface temperature measurement with minimal impact on the physical characteristics of the supporting components. In this study, NiCr and NiSi films were prepared with radio frequency(RF) magnetron sputtering and the influences of vacuum annealing on the resistivity of the films were investigated. Afterward, NiCr–NiSi films were deposited on Ni-based superalloy substrates to form TFTCs. The overall dimension of the thermocouple is 64 mm in length, 8 mm in width and 30 lm in thickness. Compared with those of as-deposited sample, the thermoelectric property and stability of the TFTC are significantly improved by vacuum annealing of NiCr and NiSi films. The variation of the Seebeck coefficient of TFTC was discussed based on the size effect of NiCr and NiSi films. And a lower Seebeck coefficient of TFTC of 38.4 μV·℃-1 is obtained.

详情信息展示

Enhanced thermoelectric property and stability of NiCr–NiSi thin film thermocouple on superalloy substrate

Xiao-Hui Zhao,Yi-Ran Wang,Yin-Zhi Chen,Hong-Chuan Jiang,Wan-Li Zhang

State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China

摘 要:Thin film thermocouples(TFTCs) can provide fast and accurate surface temperature measurement with minimal impact on the physical characteristics of the supporting components. In this study, NiCr and NiSi films were prepared with radio frequency(RF) magnetron sputtering and the influences of vacuum annealing on the resistivity of the films were investigated. Afterward, NiCr–NiSi films were deposited on Ni-based superalloy substrates to form TFTCs. The overall dimension of the thermocouple is 64 mm in length, 8 mm in width and 30 lm in thickness. Compared with those of as-deposited sample, the thermoelectric property and stability of the TFTC are significantly improved by vacuum annealing of NiCr and NiSi films. The variation of the Seebeck coefficient of TFTC was discussed based on the size effect of NiCr and NiSi films. And a lower Seebeck coefficient of TFTC of 38.4 μV·℃-1 is obtained.

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