简介概要

MEVVA磁过滤等离子技术制备的Fe纳米颗粒薄膜结构

图书来源:二元合金相图及中间相晶体结构 二元合金相图及中间相晶体结构

作 者:唐仁政 田荣璋

出版时间:2009-05

定 价:320元

图书ISBN:978-7-81105-831-4

出版单位:中南大学出版社

详情信息展示

Dependence of domain wall structures on repetition n in[Pt(0.5 nm)/Co(0.4 nm)]_n/NiO(1.1 nm)/[Co(0.4 nm)/Pt(0.5 nm)]_n multilayers

Xiao-xia Li~(1)) and Gang Han~(2)) 1) Experimental Center,College of Science,Yanshan University,Qinhuangdao 066004,China 2) School of Materials Science and Engineering,University of Science and Technology Beijing,Beijing 100083,China

摘 要:<正>The magnetic force microscopy and a sample vibrating magnetometer have been used to investigate the domain structure in two antiferromagnetically coupled Co/Pt multilayers.In the antiferromagnetic coupled[Pt(0.5 nm)/Co(0.4 nm)]_n/NiO(1.1 nm)/[Co(0.4 nm)/Pt(0.5 nm)]_n multilayers with perpendicular anisotropy,the antiferromagnetic interlayer coupling strength increases linearly with the repetition number n in Co/Pt multilayers.In demagnetized states,relatively shifted domain walls in the two Co/Pt multilayers are observed,with net ferromagnetic stripes formed between them for the repetition number n less than 5,and the stripe width decreases with the increase of n.The occurrence of these features can be attributed to the competition between the interlayer coupling and magnetostatic energies.

关键词:

<上一页 1 下一页 >

有色金属在线官网  |   会议  |   在线投稿  |   购买纸书  |   科技图书馆

中南大学出版社 技术支持 版权声明   电话:0731-88830515 88830516   传真:0731-88710482   Email:administrator@cnnmol.com

互联网出版许可证:(署)网出证(京)字第342号   京ICP备17050991号-6      京公网安备11010802042557号