Surface diffusivity of atomic deuterium on Ni3(Al, Ti)(110) surface with and without boron
来源期刊：中国有色金属学报(英文版)2002年第4期
论文作者：Y. W. Chung J. L. Wang
文章页码：649 - 652
Key words：surface diffusion; deuterium; hydrogen; Ni3Al
Abstract: The electron-stimulated desorption was used to measure the surface diffusivity of atomic deuterium on clean and boron-modified Ni3(Al, Ti)(110) surfaces. Boron dosing was performed using a solid-state boron ion source. Earlier studies showed that boron dissociates water readily at temperatures as low as 130K and that the resulting atomic hydrogen is bound to the surface strongly. The surface diffusion coefficient of atomic D on 0.05 monolayer boron-modified surface was measured to be about 10 times smaller than that on the clean surface. This slower diffusion of atomic hydrogen may explain why boron improves the ductility of polycrystalline Ni3Al in moist environments.
