Nb-Ti-Si三元系中化合物的形成序列

来源期刊：中南大学学报(自然科学版)2002年第4期

论文作者：王日初 金展鹏 柳春雷

文章页码：385 - 388

关键词：Nb-Ti-Si三元系;扩散偶;界面反应;扩散通道

Key words：Nb-Ti-Si ternary system; diffusion couple; interfacial reactions; diffusion path

摘    要：运用扩散偶技术将Nb-80%Ti, Nb-60%Ti, Nb-40%Ti和Nb-20%Ti合金与Si组成扩散偶在1 373 K时退火,用电子探针微区成分分析法对其扩散层进行成分分析.研究结果表明:Si是Nb-Ti/Si界面反应中扩散最快的元素;Nb-80%Ti/Si,Nb-60%Ti/Si,Nb-40%Ti/Si,Nb-20%Ti/Si扩散偶的扩散通道分别为TiSi₂→TiSi→Ti₅Si₄→Ti₅Si₃→Ti₃Si→Be-ta,TiSi₂→TiSi→Ti₅Si₄→Beta,NbSi₂→Nb₅Si₃→Beta,NbSi₂→Nb₅Si₃→Beta;此外,将这些扩散通道叠加到Nb-Ti-Si于1 373 K时的等温截面上,可以看出不同成分的Nb-Ti合金与Si扩散时中间化合物的形成序列.

Abstract: A series of Nb-Ti/Si couples is obtained with diffusion couple technique. Interfacial reactions between Nb-80%Ti, Nb-60%Ti, Nb-40%Ti, Nb-20%Ti alloys and Si at 1373 Kare studied. The composition of diffusion layers is analysed by EMPA. The results show that Si is the fastest diffusion species among the three elements during the reaction, the diffusion path is TiSi₂→TiSi→Ti₅Si₄→Ti₅Si₃→Ti₃Si→Be-ta,TiSi₂→TiSi→Ti₅Si₄→Beta,NbSi₂→Nb₅Si₃→Beta,NbSi₂→Nb₅Si₃→Beta for Nb-80%Ti/Si, Nb-60%Ti/Si, Nb-40%Ti/Si and Nb-20%Ti/Si couples react at 1 373 K respectively. These reaction paths are in agreement with the isothermal section of Nb-Ti-Si ternary system at 1 373 K. The formation sequence of intermetallic compounds in Nb-Ti/Si couples can be obtained from the isothermal section of Nb-Ti-Si tenary system superimposed with these reaction paths.