Preparation and characterization of nano-crystalline diamond films on glass substrate

Fanxiu Lu;Wubao Yang;Zhilin Liu;Weizhong Tang;Yumei Tong Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China

摘 要：<正> Adherent nano diamond films were successfully deposited on glass substrate by microwave plasma assisted CVD methodin H₂-CH₄ and Ar-CH₄ environment. Raman, AFM （Atomic Force Microscope）, TEM （Transmission Electron Microscope）, FTIR,and Nano Indentation techniques were used for characterization of the obtained nano diamond films. It was found that the averagegrain size was less than 100 nm with a surface roughness value as low as 2 nm. The nano diamond films were found to have excel-lent transparency in visible and IR spectrum range, and were as hard as natural diamond. Experimental results were presented.Mechanisms for nano diamond film deposition were discussed.

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