Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry

来源期刊:中南大学学报(英文版)2012年第9期

论文作者:聂西度 梁逸曾 唐有根 谢华林

文章页码:2416 - 2420

Key words:high resolution inductively coupled plasma mass spectrometry; high purity nickel; trace element; matrix effect; internal standard

Abstract: The contents of Mg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was dissolved in HNO3 and HCl by microwave digestion. Most of the spectral interferences could be avoided by measuring in the high resolution mode. The matrix effects because of the presence of excess HCl and nickel were evaluated. Correction for matrix effects was made using Sc, Rh and Tl as internal standards. The optimum conditions for the determination were tested and discussed. The detection limits range from 0.012 to 1.76 μg/g depending on the type of elements. The applicability of the proposed method is also validated by the analysis of high purity nickel reference material (NIST SRM 671). The relative standard deviation (RSD) is less than 3.3%. Results for determination of trace elements in high purity nickel were presented.

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