PREPARATION AND PROPERTIES OF Ni-Cr AND Fe-Cr-Al FILMS BY VACUUM EVAPORATION
来源期刊：Acta Metallurgica Sinica2003年第4期
论文作者：C.M.Li X.W.Shi Z.Y.Liu D.C.Zeng
Key words：vacuum evaporation; resistance of film; vacuity;
Abstract: Ni-Cr and Fe-Cr-Al films deposited on the Al2O3 substrate are studied by a method of vacuum evaporation in this paper. Influence of resistance value on density and evaporation parameters of the films reveals that the resistance of films and the adhesion of films to substrates are determined by the evaporation time and the substrate temperate under the condition of the maximum vacuity of 6.2×10-4 pa, respectively.
C.M.Li1，X.W.Shi1，Z.Y.Liu1，D.C.Zeng1
(1.Institute of Materials Science & Technology, College of Mechanical Engineering, South China University of Technology, Guangzhou 510640, China)
Abstract:Ni-Cr and Fe-Cr-Al films deposited on the Al2O3 substrate are studied by a method of vacuum evaporation in this paper. Influence of resistance value on density and evaporation parameters of the films reveals that the resistance of films and the adhesion of films to substrates are determined by the evaporation time and the substrate temperate under the condition of the maximum vacuity of 6.2×10-4 pa, respectively.
Key words:vacuum evaporation; resistance of film; vacuity;
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