离子束增强沉积制备CrN_x薄膜

来源期刊：中国有色金属学报1999年第1期

论文作者：唐宾 朱晓东 胡奈赛 何家文

文章页码：69 - 72

关键词：离子束增强沉积(IBED)，薄膜，CrN_x，摩擦磨损

Key words：IBED, film, CrN_x, wear and tear

摘    要：利用离子束增强沉积(IBED)技术制备了CrN_x薄膜。 对不同能量氮离子轰击所制备的薄膜进行了X射线衍射、 X射线光电子能谱分析、 膜层断裂韧性以及摩擦学性能研究。 试验结果表明， 在相同试验条件下， 氮离子轰击能量影响CrN_x薄膜的相组成及取向， 低能氮离子轰击所制薄膜具有较高的K_IC数值， 且表现出更优异的摩擦学性能。

Abstract: CrN_x films were synthesized with 4, 8 and 12 keV nitrogen ion of dose of 3.38×10¹³ cm^-2·s^-1 by IBED. The structure of the films was characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), wheras the wear and tear properties of the films were investigated on a block-on-ring tester. Results indicate that the phases and orientation of CrN_x are affected obviously by nitrogen ion bombarding energy, and films with lower energy have better tribological property and higher fracture toughness, especially for 4keV.