简介概要

Evaluation of Interfacial Adhesion Property for Thin Hard Films with Fuzzy Method

来源期刊:Journal Of Wuhan University Of Technology Materials Science Edition2010年第5期

论文作者:朱强

文章页码:829 - 831

摘    要:According to nanoscratch results for the TiN film, an evaluation method for interfacial fracture toughness of thin hard films is presented with fuzzy concepts, which can account for such influential factors in scratch test as surface roughness and material imperfection. Based on configuration changes in scratching curves, the parameters RV and RF are defined as the relative ratios of tip vertical displacement and of friction coefficinet. Fuzzy features of the scratching curves are analyzed carefully. The critical load is deduced from fuzzy logic operations and used to calculate the value of interfacial fracture toughness. With this method, the interfacial fracture toughness of TiN/HSS is evaluated approximately as 4.18 MPam1/2. Results show that the method is valid and can benefit the interfacial adhesion property investigation for thin hard films.

详情信息展示

Evaluation of Interfacial Adhesion Property for Thin Hard Films with Fuzzy Method

朱强

School of Mechanical Engineering, Zhengzhou University

摘 要:According to nanoscratch results for the TiN film, an evaluation method for interfacial fracture toughness of thin hard films is presented with fuzzy concepts, which can account for such influential factors in scratch test as surface roughness and material imperfection. Based on configuration changes in scratching curves, the parameters RV and RF are defined as the relative ratios of tip vertical displacement and of friction coefficinet. Fuzzy features of the scratching curves are analyzed carefully. The critical load is deduced from fuzzy logic operations and used to calculate the value of interfacial fracture toughness. With this method, the interfacial fracture toughness of TiN/HSS is evaluated approximately as 4.18 MPam1/2. Results show that the method is valid and can benefit the interfacial adhesion property investigation for thin hard films.

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