Anode oxidation of HCHO in THPED-containing electroless copper plating solution

来源期刊：中南大学学报(英文版)2008年第5期

论文作者：郑雅杰 肖发新 邹伟红 王勇

文章页码：669 - 669

Key words：electroless copper plating; anode oxidation; THPED; HCHO; electrochemical mechanism

Abstract: The electrochemical mechanism of anode oxidation of HCHO in electroless copper plating solution with N, N, N′, N′- tetrakis(2-hydroxypropyl)ethylenediamine (THPED) was investigated by measuring cyclic voltammetry curves and anodic polarization curves. Three different oxidation peaks occur at the potentials of -0.62 V (Peak 1), -0.40 V (Peak 2) and -0.17 V (Peak 3) in the anode oxidation process of THPED-containing solution. The reaction at Peak 1, a main oxidation reaction, is the irreversible reaction of adsorbed HCHO with hydrogen evolution. The reaction at Peak 2, a secondary oxidation reaction, is the quasi-reversible reaction of adsorbed HCHO without hydrogen evolution. The reaction at Peak 3 is the irreversible oxidation of anode copper. The current density of Peak 1 increases gradually, that of Peak 2 remains constant and that of Peak 3 decreases with the increase of HCHO concentration. The current density of Peak 3 increases with the increase of THPED concentration and the complexation of THPED promotes the dissolution of anode copper.

基金信息：Innovation Fund of Guangdong Province of China